LANRAN® Sepcial IEM
CEP is developed for electroplating in LANRAN® series. It selectively permeates Cu2+ and Sn2+ and prevents the passage of other additive components to get a good electroplating effect, and it is usually used for the purification of electroplating solution. For environments containing H2O2 and other strong oxidizing environments, perfluoro sulfonic acid membrane NS-260 is required.
Remain stable in acid/alkali solutions.
Low ion leakage, ensure the purity of plating solution.
High ion selectivity, can block impurities on anode side.
Electroplating in integrated circuit manufacturing.
Electroplating in other non-oxidizing environment.
Thickness （mm） | Burst strength （MPa） | Resistance（0.5N NaCl） （Ω·cm2） | Temperature （℃） | pH Running | pH Cleaning |
<0.20 | >0.5 | 3.0 | 25~40 | 0-14 | 0-14 |
*This membrane can be customized according to special requirements, such as H+ transmission rate control to ensure the pH of electroplating solution.
Size（mm） | Unit | Pre-cut | Package | Mate |
- | Piece | Yes | Wooden case | - |
* Customer can provide the size and Lanran will make the pre-cut before shipment.
